Lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsJan VAN EIJK, Sjoerd Nicolaas Lambertus DONDERS, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Johannes Petrus Martinus Bernardus VERMEULEN, Koen Jacobus Johannes Maria ZAAL, Marinus Jan REMIE
Life of this patent
Estimating the term…
Abstract
The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets.
Claims19
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the apparatus comprising a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector configured to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets.
Dependencies are inferred from the claim text.