Method for forming an imprint pattern
AssigneeKabushiki Kaisha Toshiba
InventorsHiroshi TOKUE, Takumi Ota
Life of this patent
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Abstract
A method for forming an imprint pattern includes: contacting a template having a first pattern with a curable material on a substrate to be treated and curing the curable material; releasing the template from the curable material after curing to form a second pattern made of the curable material such that the first pattern is transferred and formed as the second pattern for the substrate; measuring at least one of a load or time requiring for separation of the template when the template is separated from the curable material after transferring and forming; and comparing the load or time measured with a predetermined threshold value and determining whether the load or time measured is beyond the predetermined threshold value or not.
Claims10
A method for forming an imprint pattern, comprising:
- contacting a template having a first pattern with a curable material on a substrate to be treated and curing the curable material;
- releasing the template from the curable material after curing to form a second pattern made of the curable material such that the first pattern is transferred and formed as the second pattern for the substrate;
- measuring at least one of a load or time requiring for separation of the template when the template is separated from the curable material after transferring and forming;
- and
- comparing the load or time measured with a predetermined threshold value and determining whether the load or time measured is beyond the predetermined threshold value or not.
Dependencies are inferred from the claim text.