High utilization rotatable target using ceramic titanium oxide ring

A method for making a sputtering target assembly, comprising:

• coaxially stacking at least one hollow cylindrical sputtering target onto a backing tube, each of the at least one hollow cylindrical sputtering target comprising a first ceramic material;
• coaxially stacking at least one hollow cylindrical collar respectively between at least one end of the backing tube and the at least one hollow cylindrical sputtering target, each of the at least one hollow cylindrical collars having a second ceramic material different than the first ceramic material;
• and
• coupling the at least one hollow cylindrical sputtering target and the at least one hollow cylindrical collar to the backing tube with an adhesive material.

A sputtering target assembly, comprising:

• a backing tube having a central portion, a first end and a second end;
• a magnetic structure disposed within the backing tube, the magnetic structure having a turnaround portion near each of the first and second ends of the backing tube;
• at least one cylindrical sputtering target member coupled to the backing tube at the central portion, each of the at least one cylindrical sputtering target members having a first ceramic material and a first thickness;
• and
• at least one collar coupled to the backing tube at an area between one of the first and second ends and the at least one cylindrical sputtering target member, each of the at least one collar comprising a second ceramic material different than the first ceramic material, wherein the collar is disposed over the turnaround portion, and the sputtering rate of the at least one collar is less than or equal to the sputtering rate of the at least one cylindrical sputtering target member.