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US 2010/0300874 A1Published application
Patterning magnetic recording media with ion implantation utilizing a combination of heavy and light ion species
OwnerDavid Shiao-Min Kuo, Dieter Weller +3inventors
InventorsDavid Shiao-Min Kuo, Dieter Weller, Jan-Ulrich Thiele, Justin Hwu, Paritosh Rajora
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Abstract
A patterned magnetic layer is formed by bombardment of a masked high Mrt magnetic layer with a combination of both heavy ion species and light ion species. The method can be implemented as sequential process steps or in a single process step with the proper heavy/light ion species mixture. Advantageously, the combined heavy/light ion species bombardment method results in a patterned magnetic layer having high topographical uniformity across its surface.
Claims5
A method of patterning a high Mrt magnetic layer, the method comprising:
- bombarding exposed regions of a masked high Mrt magnetic layer with a combination of heavy ion species that result in etching of the exposed regions and light ion species that result in swelling of the exposed regions, the combination bombardment resulting in the formation of substantially planar low Mrt regions in the high Mrt magnetic layer.
Dependencies are inferred from the claim text.