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OwnerShinichi MITANI, Kunihiko SUZUKI +1inventors
InventorsShinichi MITANI, Kunihiko SUZUKI, Toshiro TSUMORI
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The present invention provides a coating apparatus capable of efficiently performing a deposition process and also provides an efficient coating method. A coating apparatus 1 for performing a deposition process on substrates W placed in a coating chamber by metalorganic chemical vapor deposition includes three or more coating chambers, e.g., a first coating chamber 2, a second coating chamber 102, and a third coating chamber 202. These coating chambers are configured such that each coating chamber is controlled independently of the other coating chambers to form a different film on the substrates W by controlling at least the composition of the material gas, the flow rate of material gas, the temperature, and the pressure in the coating chamber. A cleaning unit 5 is provided outside the coating chambers 2, 102, 202 to clean the susceptor after the deposition process.
A coating apparatus for performing a deposition process on a substrate placed in a coating chamber by metalorganic chemical vapor deposition, said coating apparatus comprising three or more said coating chambers, wherein said three or more coating chambers are configured such that each coating chamber is controlled independently of the other coating chambers to form a different film on said substrate by controlling at least the composition of the material gas, the flow rate of material gas, the temperature, and the pressure in the coating chamber.
A coating method comprising:
Dependencies are inferred from the claim text.