Delivery device comprising gas diffuser for thin film deposition
OwnerShelby F. Nelson, David H. Levy +1inventors
InventorsShelby F. Nelson, David H. Levy, Roger S. Kerr
Life of this patent
Estimating the term…
Abstract
A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material. A system capable of carrying out such a process is also disclosed.
Claims17
A process for depositing a thin film material on a substrate, comprising simultaneously directing a series of gas flows from an output face of a delivery head toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material;
- wherein the delivery head comprises a gas diffuser element through which passes at least one of the first reactive gaseous material, the inert purge gas, and the second reactive gaseous material while maintaining flow isolation of the at one gaseous material;
- wherein the gas diffuser provides a friction factor for gaseous material passing therethrough, during thin film material deposition on the substrate, that is greater than 1×102.
A process for depositing a thin film material on a substrate, comprising simultaneously directing a series of gas flows from an output face of a delivery head toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material;
- wherein a gas diffuser comprises a porous material through which passes at least one of the first reactive gaseous material, the second reactive gaseous material, and the inert purge gas, thereby providing back pressure and promoting the equalization of pressure where the flow of the at least one of the first reactive gaseous material, the second reactive gaseous material, and the inert purge gas exits the delivery device.
Dependencies are inferred from the claim text.