Deposition of high vapor pressure materials
AssigneeVeeco Instruments Inc.
InventorsScott Wayne Priddy, Chad Michael Conroy
Life of this patent
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Abstract
The present invention provides deposition sources, systems, and related methods that can efficiently and controllably provide vaporized material for deposition of thin-film materials. The deposition sources, systems and related methods described herein can be used to deposit any desired material and are particularly useful for depositing high vapor pressure materials such as selenium in the manufacture of copper indium gallium diselenide based photovoltaic devices.
Claims20
A vacuum deposition apparatus comprising a vacuum deposition source comprising a body having a crucible for holding deposition material and a nozzle positionable within a vacuum deposition chamber for directing vaporized source material to a substrate within the vacuum deposition chamber, the nozzle comprising:
- a conductance tube in fluid communication with the crucible, the conductance tube comprising one or more openings through which vaporized deposition material can pass;
- a jacket surrounding at least a portion of the conductance tube, the jacket providing a region within which the at least a portion of the conductance tube is positioned;
- and
- at least one heater element positioned within the jacket.
A nozzle for a vacuum deposition source, the nozzle positionable within a vacuum deposition chamber for directing vaporized source material to a substrate within the vacuum deposition chamber, the nozzle comprising:
- a conductance tube that can be connected in fluid communication with a source of deposition material, the conductance tube comprising one or more nozzle openings through which vaporized deposition material can pass;
- a jacket surrounding at least a portion of the conductance tube, the jacket providing a vacuum tight enclosure within which the at least a portion of the conductance tube is positioned;
- and
- at least one heater element positioned within the jacket.
A method for providing high vapor pressure material to a vacuum chamber, the method comprising:
- providing a source of vaporized deposition material within a conductance tube;
- enclosing at least a portion of the conductance tube within a jacket;
- positioning the jacket and conductance tube within a vacuum chamber;
- maintaining the region within the jacket and outside of the conductance tube at or near atmospheric pressure;
- heating the at least a portion of the conductance tube with a heating element positioned within the jacket and outside of the conductance tube;
- and
- emitting vaporized deposition material from the at least a portion of the conductance tube.
Dependencies are inferred from the claim text.