Wafer process chamber leak detector

A wafer process chamber leak detector, comprising:

• a wafer process chamber housing a wafer support device;
• a gas supply line coupling a gas supply to the wafer support device and operable to supply a gas to a wafer located on the wafer support device;
• an indicator member coupled to the gas supply line between the gas supply and the wafer support device;
• a final valve located on the gas supply line between the gas supply and the indicator member, wherein there are no valves located on the gas supply line between the final valve and the indicator member and there are no valves located on the gas supply line between the indicator member and the wafer support device;
• a reflecting member located adjacent the indicator member;
• an emitter operable to direct a light through the indicator member in order to be reflected off the reflecting member;
• and
• a receiver operable to receive the light that is reflected off the reflecting member.

A method for monitoring leaks in a wafer process chamber, comprising:

• providing a wafer process chamber coupled to a gas supply by a gas supply line, wherein an indicator member is coupled to the gas supply line between the gas supply and the wafer process chamber, and a final valve is located on the gas supply line between the gas supply and the indicator member;
• supplying a gas from the gas supply to the wafer process chamber through the gas supply line;
• emitting a light and directing the light through the indicator member;
• reflecting the light that was directed through the indicator member using a reflecting member;
• and
• receiving the reflected light and comparing the reflected light received to the light emitted in order to determine that a color of the indicator member has changed and a leak has been detected in the gas supply line.