Method for making alignment mark on substrate
AssigneeHon Hai Precision Industry Co., Ltd.
InventorSEI-PING LOUH
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Abstract
An exemplary method for making an alignment mark on a substrate includes the following steps. First, a substrate with a recess is provided. Second, a photoresist layer is formed on a surface of the substrate including in the recess. Third, the photoresist layer is exposed and developed to leave a body of remaining photoresist in the recess, with the body of remaining photoresist protruding above the surface of the substrate. Fourth, a metal layer is formed in an unfilled area of the recess and on the surface of the substrate, with the metal layer substantially surrounding the remaining photoresist. Finally, the remaining photoresist is removed to form an alignment mark in the metal layer on the substrate.
Claims12
A method for making an alignment mark on a substrate, the method comprising:
- providing a substrate with a recess;
- forming a photoresist layer on a surface of the substrate including in the recess;
- exposing and developing the photoresist layer to leave a body of remaining photoresist in the recess, the remaining photoresist protruding above the surface of the substrate;
- forming a metal layer in an unfilled area of the recess and on the surface of the substrate, the metal layer substantially surrounding the remaining photoresist;
- and
- removing the remaining photoresist to form an alignment mark in the metal layer on the substrate.
A method for making an alignment mark on a substrate, the method comprising:
- providing a substrate that has a surface;
- forming a recess on the substrate by a turning method;
- forming a photoresist layer on the surface of the substrate including in the recess by a spin coating method;
- exposing and developing the photoresist layer to leave a portion of the photoresist remaining in the recess, the remaining portion of photoresist protruding above the surface of the substrate;
- forming a metal layer on the surface of the substrate including an unfilled area of the recess, the metal layer substantially surrounding the portion of remaining photoresist;
- and
- removing the portion of remaining photoresist to obtain an alignment mark in the metal layer on the substrate.
Dependencies are inferred from the claim text.