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US 2010/0248149 A1Published application
Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition
AssigneeFUJIFILM Corporation
InventorsTomotaka Tsuchimura, Hidenori Takahashi, Takayuki Ito, Takeshi Inasaki, Shohei Kataoka
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Abstract
Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.
Claims11
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation,
- wherein
- a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.
Dependencies are inferred from the claim text.