Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

An actinic-ray- or radiation-sensitive resin composition comprising a hydrophobic resin (HR) containing a fluorine atom, wherein the hydrophobic resin (HR) comprises any of repeating units (a) of general formula (I) or (II) below:

• in which each of R1, R2, R3 and R4 independently represents a hydrogen atom, a fluorine atom, a chlorine atom, a carboxyl group, an alkyl group, a cycloalkyl group, an alkyloxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkylcarbonyloxy group, an arylcarbonyloxy group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an alkyl ether group, an aryl ether group, a hydroxyl group, an alkyl amido group, an aryl amido group, an aryl group, a cyano group, an acid decomposable group or an alkali decomposable group, provided that the hydrogen atoms of the alkyl group, cycloalkyl group, alkyloxy group, alkylcarbonyl group, arylcarbonyl group, alkylcarbonyloxy group, arylcarbonyloxy group, alkyloxycarbonyl group, aryloxycarbonyl group, alkyl ether group, aryl ether group, alkyl amido group, aryl amido group, aryl group, acid decomposable group and alkali decomposable group may be partially or wholly replaced by fluorine atoms, and provided that any two of the R1, R2, R3 and R4 may be bonded to each other to thereby form a ring.