Software-controlled maskless optical lithography using fluorescence feedback

An optical lithography apparatus comprising:

• a light source, configured to provide light at a first wavelength to expose a photoresist of a target substrate, and configured to provide light at a second wavelength to induce a fluorescence response from the target substrate without exposing the photoresist of the target substrate for performing lithography;
• a spatial light modulator (SLM), configured to controllably direct light from the light source at the first or second wavelengths to desired locations of the photoresist of the target substrate;
• a fluorescence response detector, configured to detect a fluorescence response from the target substrate in response to light at the second wavelength received at the target substrate;
• and
• a controller circuit, configured to use information about the fluorescence response to control an aspect of lithography performed on the target substrate using the SLM.

An optical photolithography method comprising:

• selectively exposing a target substrate to a light source, including spatially modulating light using a spatial light modulator (SLM) for performing lithography, the selectively exposing including automatically directing light from the light source toward the substrate under programmatic control;
• measuring a fluorescence signal from the substrate in response to light directed from the light source toward the substrate;
• and
• using the fluorescence signal as a feedback signal to control the selectively exposing the substrate to the light source for the lithography being performed using the SLM.