Resist composition, resist layer, imprinting method, pattern formation, method for producing magnetic recording medium, and magnetic recording medium

A resist layer comprising:

• a fluorine-containing compound A and a fluorine-containing compound B in a surface layer region of the resist layer which lies from a surface of the resist layer to a depth of 2.4 nm or less from the surface,
• wherein the resist layer is formed by applying a resist composition, and
• wherein the resist composition comprises at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.;
• the fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater;
• and the fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.

An imprinting method comprising:

• pressing an imprint mold, which has a patterned shape, against a resist layer from the side of a surface layer region of the resist layer so as to imprint the resist layer with a resist pattern made by transferring the patterned shape as a template,
• wherein the resist layer comprises a fluorine-containing compound A and a fluorine-containing compound B in the surface layer region which lies from a surface of the resist layer to a depth of 2.4 nm or less from the surface,
• wherein the resist layer is formed by applying a resist composition, and
• wherein the resist composition comprises at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.;
• the fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater;
• and the fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.

A pattern formation comprising:

• a patterned shape formed by performing etching, using as a mask a resist pattern formed by an imprinting method,
• wherein the imprinting method comprises pressing an imprint mold, which has a patterned shape, against a resist layer from the side of a surface layer region of the resist layer so as to imprint the resist layer with the resist pattern made by transferring the patterned shape as a template,
• wherein the resist layer comprises a fluorine-containing compound A and a fluorine-containing compound B in the surface layer region which lies from a surface of the resist layer to a depth of 2.4 nm or less from the surface,
• wherein the resist layer is formed by applying a resist composition, and
• wherein the resist composition comprises at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.;
• the fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater;
• and the fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.

A method for producing a magnetic recording medium, comprising:

• forming a resist layer over a substrate and pressing an imprint mold, which has a patterned shape, against the resist layer from the side of a surface layer region of the resist layer so as to imprint the resist layer with a resist pattern made by transferring the patterned shape as a template;
• and
• performing etching, using as a mask the resist pattern formed by the imprinting, so as to form a pattern at a magnetic layer,
• wherein the resist layer comprises a fluorine-containing compound A and a fluorine-containing compound B in the surface layer region of the resist layer which lies from a surface of the resist layer to a depth of 2.4 nm or less from the surface,
• wherein the resist layer is formed by applying a resist composition, and
• wherein the resist composition comprises at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.;
• the fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater;
• and the fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.

A magnetic recording medium comprising:

• a substrate;
• and
• a magnetic layer patterned by a method comprising:
• forming a resist layer over the substrate and pressing an imprint mold, which has a patterned shape, against the resist layer from the side of a surface layer region of the resist layer so as to imprint the resist layer with a resist pattern made by transferring the patterned shape as a template;
• and
• performing etching, using as a mask the resist pattern formed by the imprinting, so as to form a pattern at the magnetic layer,
• wherein the resist layer comprises a fluorine-containing compound A and a fluorine-containing compound B in the surface layer region of the resist layer which lies from a surface of the resist layer to a depth of 2.4 nm or less from the surface,
• wherein the resist layer is formed by applying a resist composition, and
• wherein the resist composition comprises at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.;
• the fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater;
• and the fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.