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US 2010/0247930 A1Published application
Epitaxial Layers on Oxidation-Sensitive Substrates and Method of Producing Same
AssigneeMark A. Zurbuchen
InventorMark A. Zurbuchen
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Abstract
This invention disclosure describes methods for the fabrication of metal oxide films on surfaces by topotactic anion exchange, and laminate structures enabled by the method. A precursor metal-nonmetal film is deposited on the surface, and is subsequently oxidized via topotactic anion exchange to yield a topotactic metal-oxide product film. The structures include a metal-oxide layer(s) and/or a metal-nonmetal layer(s).
Claims36
A functional laminate structure, comprising:
- a substrate having a surface;
- and
- a crystalline layer comprising an oxide selected from the group of A(O,X)y, doped substituents thereof, anion-deficient versions thereof, and anion-excess versions thereof, wherein A is a metal, O is oxygen, X is a nonmetal constituent, y represents the stochiometry of O and X relative to A, and the crystalline layer is on the surface.
A method of fabricating an epitaxial layer on an oxidation-sensitive substrate:
- providing an oxidizable substrate having a surface;
- heating the substrate;
- and
- depositing a crystalline film on the surface via vapor deposition comprising delivering to the substrate a gas bearing a metal (A), oxygen (O) and a nonmetal (X), the oxygen content of the gas being such that the substrate does not oxidize at the temperature of deposition;
- wherein the deposited crystalline film comprises an oxide selected from the group of A(O,X)y, doped substituents thereof, anion-deficient versions thereof, and anion-excess versions thereof, wherein y represents the stochiometry of O and X relative to A.
2 more elements
Dependencies are inferred from the claim text.