Method for forming coating film and method for manufacturing piezoelectric element
AssigneeSeiko Epson Corporation
InventorYoichi NODA
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Abstract
A method for forming a coating film on an object having a top surface, a side surface, and a corner where the top and side surfaces intersect, includes discharging droplets of coating forming material from a nozzle to deposit the droplets on the corner of the object to form a first coating film on the corner, and immersing the object in an immersion coating liquid after the first coating film is formed on the corner of the object to form a second coating film on the top and side surfaces of the object and on the first coating film.
Claims11
A method for forming a coating film on an object having a top surface, a side surface, and a corner where the top and side surfaces intersect, the method comprising:
- discharging droplets of coating forming material from a nozzle to deposit the droplets on the corner of the object to form a first coating film on the corner;
- and
- immersing the object in an immersion coating liquid after the first coating film is formed on the corner of the object to form a second coating film on the top and side surfaces of the object and on the first coating film.
A method for manufacturing a piezoelectric element including an electrode formed on a piezoelectric element piece having a top surface, a side surface and a corner where the top and side surfaces intersect, the method comprising:
- forming a metal film on the piezoelectric element piece;
- forming a resist mask on a surface of the metal film;
- and
- patterning the metal film using the resist mask to form the electrode,
- the forming of the resist mask including
- discharging droplets of a resist liquid from a nozzle to deposit the droplets on the corner of the piezoelectric element piece to form a first resist film on the corner,
- immersing the piezoelectric element piece in the resist liquid after the first resist film is formed on the corner of the piezoelectric element piece to form a second resist film on the top and side surfaces of the piezoelectric element piece and on the first resist film, and
- exposing and developing the first resist film and the second resist film to form the resist mask.
Dependencies are inferred from the claim text.