Film Deposition Apparatus, Method for Depositing Film, and Method for Manufacturing Lighting Device

A film deposition apparatus comprising:

• a first evaporation source having a first film deposition material so as to deposit the first film deposition material on a first region in a surface of a substrate;
• a second evaporation source having a second film deposition material so as to deposit the second film deposition material on a second region in the surface of the substrate;
• a substrate holding portion configured to face the surface of the substrate and the first and second evaporation sources;
• and
• a driving portion configured to move the substrate and either one or both of the first and second evaporation sources relatively while depositing the first and second film deposition materials on the surface of the substrate.

A film deposition method comprising the steps of:

• setting a substrate on a substrate holding portion in a chamber;
• disposing a first evaporation source having a first film deposition material in the chamber so as to deposit the first film deposition material on a first region in a surface of the substrate at a certain moment;
• disposing a second evaporation source having a second film deposition material in the chamber so as to deposit the second film deposition material on a second region in the surface of the substrate at the certain moment;
• and
• relatively moving either one or both of the substrate and the first and second evaporation sources during deposition of the first and second film deposition materials on the surface of the substrate.

A film deposition method comprising the steps of:

• setting a substrate on a substrate holding portion in a chamber;
• disposing a first evaporation source having a first film deposition material in the chamber so as to deposit the first film deposition material on a first region in a surface of the substrate;
• disposing a second evaporation source having a second film deposition material in the chamber so as to deposit the second film deposition material a second region in the surface of the substrate;
• and
• depositing the first film deposition material supplied from the first evaporation source and the second film deposition material supplied from the second evaporation source on the surface of the substrate while spinning the substrate.