Sputter ion pump
AssigneesTsinghua University, Hon Hai Precision Industry Co., Ltd.
InventorsLi Qian, Jie Tang, Liang Liu, Jing Qi, Pi-Jin Chen, Zhao-Fu Hu, Shou-Shan Fan
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AssigneesTsinghua University, Hon Hai Precision Industry Co., Ltd.
InventorsLi Qian, Jie Tang, Liang Liu, Jing Qi, Pi-Jin Chen, Zhao-Fu Hu, Shou-Shan Fan
Estimating the term…
A sputter ion pump includes one vacuum chamber, two parallel anode poles and one cold cathode electron emitter. The vacuum chamber includes at least one aperture located in an outer wall thereof. The two parallel anode poles are positioned in the vacuum chamber and arranged in a symmetrical configuration about a center axis of the vacuum chamber. The cold cathode electron emission device is located on or proximate the outer wall of the vacuum chamber and faces a corresponding aperture. The cold cathode electron emission device is thus configured for injecting electrons through the corresponding aperture and into the vacuum chamber. The sputter ion pump produces a saddle-shaped electrostatic field and is free of a magnetic field. The sputter ion pump has a simplified structure and a low power consumption.
A sputter ion pump comprising:
(canceled)
(canceled)
A sputter ion pump comprising:
A sputter ion pump completely without a magnetic field during normal operation comprising:
Dependencies are inferred from the claim text.