El device, light-sensitive material for forming conductive film, and conductive film
AssigneeFUJIFILM Corporation
InventorTsukasa TOKUNAGA
Life of this patent
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Abstract
An EL device (1), contains: a transparent support (21), a conductive layer (2), a phosphor layer (3), a reflection insulating layer (4), and a back electrode (5); wherein the conductive layer (2), the phosphor layer (3), the reflection insulating layer (4) and the back electrode (5) are provided on the transparent support (21) in this order, and wherein the conductive layer (2) includes silica in an amount of 0.05 g/m2 or more.
Claims10
An EL device, comprising:
- a transparent support,
- a conductive layer,
- a phosphor layer,
- a reflection insulating layer, and
- a back electrode;
- wherein the conductive layer, the phosphor layer, the reflection insulating layer and the back electrode are provided on the transparent support in this order, and
- wherein the conductive layer comprises silica in an amount of 0.05 g/m2 or more.
A light-sensitive material for forming a conductive film, comprising:
- a transparent support, and
- a silver salt-containing emulsion layer provided on the transparent support;
- wherein at least one of layers provided on the silver salt-containing emulsion layer side comprises silica in an amount of 0.05 g/m2 or more.
A conductive film, comprising a conductive portion formed by exposing and developing a light-sensitive material for forming a conductive film;
- wherein the light-sensitive material comprises a transparent support, and a silver salt-containing emulsion layer provided on the transparent support;
- and
- wherein at least one of layers provided on the silver salt-containing emulsion layer side comprises silica in an amount of 0.05 g/m2 or more.
Dependencies are inferred from the claim text.