Mems sensor, mems sensor manufacturing method, and electronic device

A MEMS sensor manufacturing method for a MEMS sensor including a support portion;

• a movable weight portion;
• a connection portion connecting the support portion and the movable weight portion, is possible an elastic deformation;
• a fixed electrode portion extending from the support portion;
• and a movable electrode portion extending from the movable weight portion and disposed opposed to the fixed electrode portion, comprising:
• forming a laminated layer structure on a substrate;
• forming an adjusting layer at top layer or bottom layer of the laminated layer structure;
• forming a first cavity portion from a top layer of the laminated layer structure to surface of the substrate, by anisotropic etching;
• isotropically etching the substrate via the first cavity portion to form a second cavity portion between the substrate and the laminated layer structure.