# US 2010/0168265 A1 · Precursor composition for polyimide and use thereof

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- Number: US 2010/0168265 A1
- Document ID: US20100168265A1
- Status: Published application
- Kind: A1
- Application number: 12/572,398
- Filed: 2009-10-02
- Published: 2010-07-01
- Earliest claimed: 2008-12-31
- Assignees: Eternal Chemical Co., Ltd.
- Inventors: CHUNG-JEN WU; Pi-Jen Cheng
- Web page: https://patentgrep.com/patent/US20100168265A1

## CPC

- C08G 73/1042: {Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds}
- C08G 73/12: Unsaturated polyimide precursors
- C08G 73/121: {Preparatory processes from unsaturated precursors and polyamines}
- C08G 73/122: {containing chain terminating or branching agents}
- C08L 79/08: Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08L 79/085: {Unsaturated polyimide precursors}
- C08G: MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08L: COMPOSITIONS OF MACROMOLECULAR COMPOUNDS (compositions based on polymerisable monomers C08F, C08G; artificial filaments or fibres D01F; textile treating compositions D06)

## Abstract

The present invention provides a precursor composition for polyimides, said composition comprising an amic acid oligomer of formula (1) and a dianhydride derivative with ester (—C(O)OR) and carboxy (—C(O)OH) terminal groups of formula (2): wherein R, G, G1, P, D and m are as defined in the specification. The invention also provides polyimides synthesized from the above-mentioned precursor composition.

## Claims

### Claim 1

A precursor composition for a polyimide, comprising (a) an amic acid oligomer of formula (1):
and
(b) a compound of formula (2):
wherein
R represents a linear or branched alkyl with 1 to 14 carbon atoms, a phenol group, or an ethylenically unsaturated group;
G and G1 can be the same or different and each independently represent a tetravalent organic group;
P represents a divalent organic group;
D each independently represents a nitrogen-containing heterocyclic group or an OR*-containing group wherein R* is a linear or branched alkyl with 1 to 20 carbon atoms; and
m is an integer from 1 to 100.

### Claim 2 (depends on 1)

The precursor composition of claim 1, wherein component (a) and component (b) are present in a molar ratio ranging from 0.8:1 to 1.2:1.

### Claim 3 (depends on 1)

The precursor composition of claim 1, wherein component (a) and component (b) are present in a molar ratio ranging from 0.9:1 to 1.1:1.

### Claim 4 (depends on 1)

The precursor composition of claim 1, wherein the ethylenically unsaturated group is selected from the group consisting of vinyl, propenyl, methylpropenyl, n-butenyl, isobutenyl, vinylphenyl, propenylphenyl, propenyloxymethyl, propenyloxyethyl, propenyloxypropyl, propenyloxybutyl, propenyloxyamyl, propenyloxyhexyl, methylpropenyloxymethyl, methylpropenyloxyethyl, methylpropenyloxypropyl, methylpropenyloxybutyl, methylpropenyloxyamyl, and methylpropenyloxyhexyl, a group of the following formula (7), and a group of the following formula (3):
wherein, R1 is phenylene, a linear or branched C1-C8 alkylene, a linear or branched C2-C8 alkenylene, a C3-C8 cycloalkylene, or a linear or branched C1-C8 hydroxyalkylene, and R2 is H or a C1-C4 alkyl.

### Claim 5 (depends on 1)

The precursor composition of claim 1, wherein R each independently represents:

### Claim 6 (depends on 1)

The precursor composition of claim 1, wherein the tetravalent organic group is selected from the group consisting of:
wherein Y each independently represents H, a halo group, C1-C4 alkyl, or C1-C4 perfluoroalkyl, and B represents —CH2—, —O—, —S—, —CO—, —SO2—, —C(CH3)2—, or —C(CF3)2—.

### Claim 7 (depends on 6)

The precursor composition of claim 6, wherein the tetravalent organic group is selected from the group consisting of:

### Claim 8 (depends on 1)

The precursor composition of claim 1, wherein the divalent organic group is selected from the group consisting of:
wherein X each independently represents H, a halo group, C1-C4 alkyl, or C1-C4 perfluoroalkyl; A represents —O—, —S—, —CO—, —CH2—, —OC(O)—, or —CONH—; and w and z each represent an integer from 1 to 3.

### Claim 9 (depends on 8)

The precursor composition of claim 8, wherein the divalent organic group is selected from the group consisting of:

### Claim 10 (depends on 1)

The precursor composition of claim 1, wherein D is selected from the group consisting of:

### Claim 11 (depends on 1)

The precursor composition of claim 1, wherein m is an integer from 5 to 50.

### Claim 12 (depends on 1)

The precursor composition of claim 1, further comprising a polar aprotic solvent selected from the group consisting of N-methylpyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, dimethyl sulfoxide, and a mixture thereof.

### Claim 13 (depends on 1)

The precursor composition of claim 1, further comprising a photoinitiator selected from the group consisting of benzophenone, benzoin, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, 1-hydroxy cyclohexyl phenyl ketone, 2,4,6-trimethylbenzoyl diphenyl phosphine oxide, and a mixture thereof.

### Claim 14 (depends on 1)

The precursor composition of claim 1, further comprising a coupling agent selected from the group consisting of 3-aminopropyltrimethoxysilane (APrTMOS), 3-triaminopropyltriethoxysilane (APrTEOS), 3-aminophenyltrimethoxysilane (APTMOS), 3-aminophenyltriethoxysilane (APTEOS), and a mixture thereof.

### Claim 15 (depends on 1)

A polyimide prepared by polymerizing the precursor composition as claimed in claim 1.

### Claim 16 (depends on 1)

A method for producing a polyimide, comprising polymerizing the precursor composition as claimed in claim 1 by a chemical imidization method.

### Claim 17 (depends on 16)

The method of claim 16, wherein the chemical imidization is conducted at a temperature of no more than 150° C.