# US 2010/0167216 A1 · Exhaust apparatus, processing apparatus, and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2010/0167216 A1 - Document ID: US20100167216A1 - Status: Published application - Kind: A1 - Application number: 12/640,095 - Filed: 2009-12-17 - Published: 2010-07-01 - Earliest claimed: 2008-12-25 - Assignees: Canon Kabushiki Kaisha - Inventors: Atsushi Umemura - Web page: https://patentgrep.com/patent/US20100167216A1 ## CPC - G03F 7/70858: {Environment aspects, e.g. pressure of beam-path gas, temperature (pollution aspects G03F7/70916)} - G03F 7/70841: {Constructional issues related to vacuum environment, e.g. load-lock chamber} - G03F 7/70891: {Temperature} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract An exhaust apparatus includes a structural member; a vacuum pump configured to exhaust a gas via the structural member; and a regulator configured to regulate a temperature of the structural member. The structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other. The apparatus is configured such that the vacuum pump exhausts a gas via the through hole. ## Claims ### Claim 1 An exhaust apparatus comprising: a structural member; a vacuum pump configured to exhaust a gas via the structural member; and a first regulator configured to regulate a temperature of the structural member, wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and wherein the apparatus is configured such that the vacuum pump exhausts a gas via the through hole. ### Claim 2 (depends on 1) The exhaust apparatus according to claim 1, wherein the through hole is a hollow circular cylinder, and wherein the structural member includes a bundle of the circular cylinders. ### Claim 3 (depends on 1) The exhaust apparatus according to claim 1, wherein the structural member has a flow path for a medium, and wherein the first regulator is configured to cause the medium whose temperature is regulated to flow via the flow path. ### Claim 4 (depends on 1) A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising: the exhaust apparatus according to claim 1 for exhausting a gas from the vacuum vessel. ### Claim 5 (depends on 4) The processing apparatus according to claim 4, further comprising: a heat-radiating member arranged in the vacuum vessel so as to be separated from and so as to face the second end face; and a second regulator configured to regulate a temperature of the heat-radiating member. ### Claim 6 (depends on 5) The processing apparatus according to claim 5, further comprising a processing unit arranged in the vacuum vessel and used to process the object, wherein the heat-radiating member is arranged between the second end face and the processing unit. ### Claim 7 (depends on 4) The processing apparatus according to claim 4, further comprising: a third regulator configured to regulate a temperature of the vacuum vessel, wherein a portion of the vacuum vessel and the second end face are separated from each other and face each other. ### Claim 8 (depends on 1) A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising: an exhaust vessel connected to the vacuum vessel; the exhaust apparatus according to claim 1 connected to the exhaust vessel; a heat-radiating member arranged in the exhaust vessel so as to be separated from and so as to face the second end face; and a fourth regulator configured to regulate a temperature of the heat-radiating member. ### Claim 9 (depends on 8) The processing apparatus according to claim 8, further comprising a processing unit arranged in the vacuum vessel and used to process the object, wherein the heat-radiating member is arranged between the second end face and the processing unit. ### Claim 10 (depends on 1) A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising: an exhaust vessel connected to the vacuum vessel; the exhaust apparatus according to claim 1 connected to the exhaust vessel; and a fifth regulator configured to regulate a temperature of the exhaust vessel, wherein a portion of the exhaust vessel and the second end face are separated from each other and face each other. ### Claim 11 (depends on 10) The processing apparatus according to claim 10, further comprising: a projection system arranged in the vacuum vessel and configured to project radiant energy onto a substrate, wherein the processing apparatus is configured to transfer a pattern to the substrate by the projection system in the vacuum vessel. ### Claim 12 (depends on 11) A method of manufacturing a device, the method comprising: exposing a substrate to radiant energy to transfer a pattern to the substrate using the processing apparatus according to claim 11; developing the exposed substrate; and processing the developed substrate to manufacture the device. ### Claim 13 A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising: an exhaust vessel connected to the vacuum vessel; a structural member; a vacuum pump configured to exhaust a gas from the exhaust vessel via the structural member, the vacuum pump being arranged so as to be oriented in a second direction that differs from a first direction that is an exhaust direction from the vacuum vessel to the exhaust vessel; and a first regulator configured to regulate a temperature of the structural member, wherein the structural member is configured to absorb radiation heat from the vacuum pump along the first direction and to cause a particle to pass along the second direction. ### Claim 14 (depends on 13) The processing apparatus according to claim 13, further comprising: a heat-radiating member arranged in the exhaust vessel so as to be separated from and so as to face the structural member in the second direction; and a second regulator configured to regulate a temperature of the heat-radiating member. ### Claim 15 (depends on 13) The processing apparatus according to claim 13, further comprising a third regulator configured to regulate a temperature of the exhaust vessel, wherein a portion of the exhaust vessel and the structural member are separated from each other and face each other in the second direction. ### Claim 16 (depends on 13) The processing apparatus according to claim 13, further comprising a projection system arranged in the vacuum vessel and configured to project radiant energy onto a substrate, wherein the processing apparatus is configured to transfer a pattern to the substrate by the projection system in the vacuum vessel. ### Claim 17 (depends on 16) A method of manufacturing a device, the method comprising: exposing a substrate to radiant energy to transfer a pattern to the substrate using the processing apparatus according to claim 16; developing the exposed substrate; and processing the developed substrate to manufacture the device.