# US 2010/0166956 A1 · Vapor deposition apparatus

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- Number: US 2010/0166956 A1
- Document ID: US20100166956A1
- Status: Published application
- Kind: A1
- Application number: 12/715,222
- Filed: 2010-03-01
- Published: 2010-07-01
- Earliest claimed: 2003-08-20
- Assignees: Tadahiro Ohmi
- Inventors: Tadahiro OHMI; Yasuyuki SHIRAI; Akihiro MORIMOTO
- Web page: https://patentgrep.com/patent/US20100166956A1

## CPC

- C23C 14/564: {Means for minimising impurities in the coating chamber such as dust, moisture, residual gases}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

It has been found that an organic component is emitted from a member such as a crucible or a gasket constituting an apparatus for vacuum treatment and an element is contaminated with said organic component emitted, and, as a result, members of the apparatus for vacuum treatment are subjected to a treatment for reducing the emission of an organic component. For example, a crucible is made from a material having a reduced catalytic activity to a material for use in the vapor deposition in question and a gasket is used after a treatment for reducing the bleeding of an organic component or is made from a material containing a reduced amount of an organic component.

## Claims

### Claim 1

A deposition source container to be filled with a deposition material, the deposition source container having an inner surface formed by a material for suppressing catalytic properties between the inner surface and the deposition material.

### Claim 2 (depends on 1)

A deposition source container as claimed in claim 1, wherein the material is either an oxide or a nitride of an element selected from a group consisting of Si, Cr, Al, La, Y, Ta, and Ti.

### Claim 3 (depends on 1)

A deposition source container as claimed in claim 1, wherein the inner surface is coated on the deposition source container.

### Claim 4 (depends on 1)

A deposition source container as claimed in claim 1, wherein the inner surface has center line average roughness not greater than 100 nm.

### Claim 5 (depends on 4)

A deposition source container as claimed in claim 4, wherein the inner surface has the center line average roughness not greater than 10 nm.

### Claim 6 (depends on 1)

A deposition source container as claimed in claim 1, wherein the deposition source container has, in addition to the inner surface, the remaining portion which is formed by the same material as the inner surface.

### Claim 7 (depends on 1)

A deposition source container as claimed in claim 1, wherein the deposition source container has, in addition to the inner surface, the remaining portion which is different in material from the inner surface and which is formed by tungsten.

### Claim 8 (depends on 1)

A deposition source container as claimed in claim 1, wherein the deposition source container is composed of tungsten and coated with either an oxide or a nitride of an element selected from a group consisting of Si, Cr, Al, La, Y, Ta, and Ti .

### Claim 9 (depends on 1)

A deposition source container as claimed in claim 1, wherein the inner surface of deposition source container comprises at least one material selected from Al2o3, Cr2o3, Aln, Y2O3, La2o3, Or Mgo.

### Claim 10 (depends on 1)

A method of using the deposition source container as claimed in claim 1, comprising:
providing the deposition material for an organic el in the deposition source container; and
evaporating the deposition material in a vacuum system,
wherein the inner surface of the deposition source container reduces decomposition of the deposition material during the step of the evaporating the deposition material.