Methods and processes for modifying polymer material surface interactions
AssigneeObducat AB
InventorsJakob NILSSON, Matthias KEIL, Johan RING, Babak HEIDARI
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AssigneeObducat AB
InventorsJakob NILSSON, Matthias KEIL, Johan RING, Babak HEIDARI
Estimating the term…
The invention to provide curable materials, comprising photo-reactive compounds, in particular, photoinitiators and polymerizable mono- or multifunctional monomers such as acrylates or epoxides. The material may also contain fluoro-surfactants completely or partly terminated by functional groups with the ability to bind covalently to said chemical composition under curing. The curable compositions are either purely acrylate based or a hybrid of different types of monomers such as acrylates, epoxides or vinyl ethers. The polymerizable monomers may cure with the use of different types of photoinitiator, such as free radical photoinitiators or cationic photoinitiators, ultimately forming a hybrid resist comprising interpenetrating networks of different types of monomers e.g. acrylates and epoxides. The acrylate/epoxide hybrid system has showed improved replication properties in terms of high nano-imprint lithography process fidelity, due to increased conversion of acrylates and low shrinkage.
A process for providing a photocurable IPS material, applicable in a 2-step imprint method for the transferring of a pattern from an anti-sticking stamp to an IPS and the use of the patterned IPS as a template for the transferring of the pattern onto the surface of a substrate resist, comprising photoinitiators or catalysts with the ability to initiate polymerization, polymerizable mono- or multifunctional monomers and fluoro-surfactants completely or partly terminated by functional groups with the ability to covalently bind to the resist under curing.
A process for providing a photocurable IPS material, applicable in a 2-step imprint method for the transferring of a pattern from a non-surface treated stamp to an IPS and the use of the patterned IPS as a template for the transferring of the pattern onto the surface of a substrate resist, comprising photoinitiators or catalysts with the ability to initiate polymerization, polymerizable mono- or multifunctional acrylates, epoxides or vinyls and siloxanes completely or partly terminated by acryloyl, epoxy or vinyl functionalities with the ability to covalently bind to the resist under curing.
A method of providing photcurable substrate resist, applicable in a 2-step imprint method for the transferring of a pattern from a stamp to an IPS and the use of the patterned IPS as a template for the transferring of the pattern onto the surface of a substrate resist, comprising photoinitiators or catalysts with the ability to initiate polymerization, polymerizable mono- or multifunctional monomers and derivatives of siloxanes and polydimethylsiloxanes completely or partly terminated by functional groups with the ability to covalently bind to the resist under curing.
Dependencies are inferred from the claim text.