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AssigneeLG Chem, Ltd.
InventorsChang Ho Cho, Keon Woo Lee, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee
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A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.
A photosensitive resin composition for simultaneously forming two isolated column spacer patterns, comprising at least one radical polymerization inhibitor selected from the group consisting of compounds having two or more phenolic hydroxyl groups, compounds having at least one aromatic ring substituted with at least one imino group, cyclic compounds partially substituted with at least one imino group, and hindered amine compounds.
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