Method for tack free surface photocuring of free radically polymerizable resins under visible light photoexcitation
OwnerEugene Stizmann, Ionel Spinu +1inventors
InventorsEugene Stizmann, Ionel Spinu, Andre Bendo
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Abstract
Disclosed is a method for photocuring certain thin layer ethylenically unsaturated systems using an additive composition comprising a photoinitiator and an acrylated siloxane and irradiating the layer at wavelengths above 350 nm. For example, the additive composition comprises at least one bisacylphosphine oxide or monoacylphosphine oxide and at least one acrylated siloxane and can be cured using visible light sources such as a light emitting diode (LED). The process provides for tack free films 10 mils (=0.254 mm) thick or less.
Claims16
A process for curing compositions comprising ethylenically unsaturated polymerizable compounds to prepare tack free thin films of from about 0.1 mil to about 10 mil (i.e., 0.002 mm to 0.254 mm), which process comprises
- preparing a composition comprising
- (a) ethylenically unsaturated polymerizable compounds,
- (b) from 0.1 weight percent to 4 weight percent, based on the weight of the cured film solids, of at least one photoinitiator,
- (c) from 0.5 weight percent to 3 weight percent, based on the weight of the cured film solids, of at least one acrylated siloxane,
- and
- irradiating the composition so obtained with light comprising wavelengths of from about 350 nm to about 600 nm.
Dependencies are inferred from the claim text.