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US 2010/0159391 A1Published application
Photosensitive paste and process for production of pattern using the same
AssigneeE. I. Du Pont de Nemours and Company
InventorsKAZUSHIGE ITO, Hiroaki Noda
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Abstract
Disclosed is a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is −10° C. or less. The present paste may be used for creating a fine pattern and prevents residue from remaining in the area where paste should be removed.
Claims10
A photosensitive paste, comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is −10° C. or less.
A process for production of a pattern, comprising steps of:
- applying a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, the glass transition temperature of the polymerizable monomer being −10° C. or less;
- exposing the applied paste to light, which initiates the polymerization of the polymerizable monomer;
- developing the exposed paste, thereby forming a pattern;
- and
- sintering the pattern.
2 more elements
Dependencies are inferred from the claim text.