Loading patent…
AssigneeSilicon Light Machines Corporation
InventorsJoshua Lu, Gregory Beach, Alexander Payne, James Hunter
Estimating the term…
A method of fabricating an integrated device including a MicroElectroMechanical system (MEMS) and an associated microcircuit is provided. In one embodiment, the method comprises: forming a high temperature capable contact through a dielectric layer to an underlying element of a microcircuit formed adjacent to a MicroElectroMechanical System (MEMS) structure on a substrate; and depositing a layer of conducting material over the dielectric layer, and patterning the layer of conducting material to form a local interconnect (LI) for the microcircuit overlying and electrically coupled to the contact and a bottom electrode for the adjacent MEMS structure. Other embodiments are also provided.
A method of fabricating an integrated device comprising:
A method of fabricating an integrated device comprising:
An integrated device comprising a diffractive light modulator adjacent to a microcircuit on a single substrate, the microcircuit including a plurality of transistors formed in the substrate, a local interconnect (LI) layer and at least two metal interconnect layers through which the plurality of transistors are electrically coupled to the diffractive light modulator.
Dependencies are inferred from the claim text.