Optical system, exposure apparatus, and method of manufacturing electronic device
AssigneeNikon Corporation
InventorsMasayuki Shiraishi, Takuro Ono
Life of this patent
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Abstract
An aperture diaphragm plate is provided to define a light flux on a pupil plane of an optical system or a plane or surface disposed in the vicinity of the pupil plane. An aperture, which is formed in the aperture diaphragm plate, has a three-dimensional shape corresponding to an optimum pupil shape of the optical system. It is possible to improve the imaging characteristic brought about by the optical system by providing the optimum pupil shape of the optical system.
Claims63
An optical system comprising an aperture diaphragm which defines a light flux on a predetermined plane;
- wherein a contour of an aperture shape of the aperture diaphragm has a three-dimensional shape.
An optical system comprising at least two reflecting optical elements, wherein the optical system has a pupil plane in an optical path between the two reflecting optical elements;
- and
- a contour of the pupil plane has a three-dimensional shape.
An aperture diaphragm restricting a light flux which comes into an optical system or which exits from the optical system, the aperture diaphragm comprising a member which has an inner circumferential portion defining an aperture;
- wherein the inner circumferential portion of the member exists on a curved surface formed such that a plane, which intersects a main light beam of the light flux, is partially warped in a direction of the main light beam.
Dependencies are inferred from the claim text.