Method for a lithographic apparatus

A method of at least partially compensating for a deviation in a property of a pattern feature to be applied to a substrate using a lithographic apparatus, the method comprising:

• obtaining information related to the deviation in the property of the pattern feature;
• determining a desired phase change to be applied to at least a portion of a radiation beam that is to be used to apply the pattern feature to the substrate and which would at least partially compensate for the deviation in the property, the determination of the desired phase change comprising determining a desired configuration of a phase modulation element;
• and
• implementing the desired phase change to the portion of the radiation beam when applying the pattern feature to the substrate to at least partially compensate for the deviation in the property, the implementation of the desired phase change comprising illuminating the phase modulation element with the at least a portion of the radiation beam when the phase modulation element is in the desired configuration.