Method of structuring a photosensitive material
AssigneeCarl Zeiss SMT GmbH
InventorAksel Goehnermeier
Life of this patent
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Abstract
A method of structuring a photosensitive material is disclosed. The method includes illuminating a first object structure and projecting a pattern of the first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to the photosensitive material. The method also includes illuminating a second object structure and projecting a pattern of the second object structure onto the photosensitive material such that the projected pattern of the second object structure is focussed at a second focus position with respect to the photosensitive material. The respective patterns are projected in the same projection direction.
Claims20
A method, comprising:
- projecting a first pattern of a first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to the photosensitive material;
- and
- projecting a second pattern of a second object structure onto the photosensitive material such that the projected pattern of the second object structure is focussed at a second focus position with respect to the photosensitive material,
- wherein the first and second patterns are projected in the same projection direction, and the first and second focus positions are located within the photosensitive material.
A projection exposure system, comprising:
- an illumination system configured to illuminate first and second object structures;
- at least one optical projection objective configured to project a first pattern of the first object structure onto the photosensitive material and configured to project a second pattern of the second object structure onto the photosensitive material;
- and
- a control device configured to control the operation of the projection exposure system so that the first projected pattern is focussed at a first focus position with respect to the photosensitive material, and so that the second projected pattern is focussed at a second focus position with respect to the photosensitive material,
- wherein the first and second focus positions are located within the photosensitive material, and the first and second patterns are projected in the same projection direction.
A projection exposure system, comprising:
- a mask holder configured to hold a mask having first and second object structures at different locations of the mask;
- a material holder configured to hold a photosensitive material;
- an optical projection objective configured to image the mask onto the photosensitive material;
- and
- a control device configured to control the projection exposure system to structure the photosensitive material using the single mask by automatically performing a double exposure of the mask,
- wherein in a first exposure step the first object structure is imaged onto the photosensitive material and in a second exposure step the second object structure is imaged onto the photosensitive material so that the first and second objects are imaged onto the same location of the photosensitive material and the photosensitive material remains on the material holder during the double mask exposure.
Dependencies are inferred from the claim text.