System and method for introducing a substrate into a process chamber
AssigneeADP Engineering Co., Ltd.
InventorIn Taek LEE
Life of this patent
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Abstract
A system and method for introducing a substrate into a process chamber is provided. A presence or absence of a substrate on a stage in an apparatus for manufacturing a semiconductor or a flat panel display may be determined by lift pins used for loading and unloading a substrate, the introduction of another substrate may be prevented and a broken state or the erroneously loaded state of the substrate may be detected. An opening or closing of a gate valve may also be determined, and the introduction of a substrate into the process chamber may be prevented while the gate valve is closed.
Claims5
A method for introducing a substrate into a chamber, the method comprising:
- determining whether a substrate is positioned on a stage provided in the chamber;
- and
- thereafter transferring a substrate onto the stage for processing when it is determined that there is no substrate positioned on the stage.
Dependencies are inferred from the claim text.