Non-contact plasma-monitoring apparatus and method and plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber providing a reaction space;
• a power supply unit supplying power to the processing chamber;
• power supply wiring connecting the processing chamber to the power supply unit;
• and
• a non-contact plasma-monitoring unit measuring at least one of an electric field and a magnetic field, which are created around the power supply wiring, without physically contacting the power supply wiring.

A non-contact plasma-monitoring method comprising:

• providing a processing chamber having a reaction space in which a process using plasma is performed, a power supply unit which supplies power to the processing chamber, and power supply wiring which connects the processing chamber to the power supply unit;
• delivering power to the processing chamber via the power supply wiring;
• and
• measuring at least one of an electric field and a magnetic field, which are created around the power supply wiring, without physically contacting the power supply wiring.