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US 2010/0148407 A1Published application
Imprint Mold, Imprint Apparatus and Method of Forming Pattern
OwnerDae-Jin PARK, Kyu-Young KIM +1inventors
InventorsDae-Jin PARK, Kyu-Young KIM, Hyung-Il JEON
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Abstract
An imprint apparatus includes an imprint mold including a flexible base plate with a coefficient of thermal expansion (CTE) of about 17 ppm/° C. or less, and a mold pattern formed on the base pattern.
Claims20
An imprint mold comprising:
- a flexible base plate with a coefficient of thermal expansion (CTE) of about 17 ppm/° C. or less;
- and
- a mold pattern formed on the base pattern.
An imprint apparatus comprising:
- an imprint mold including a flexible base plate with a coefficient of thermal expansion (CTE) of about 17 ppm/° C. or less, and a mold pattern formed on the base pattern.
A method of forming a pattern, the method comprising:
- forming an imprint mold including a flexible base plate with a coefficient of thermal expansion (CTE) of about 17 ppm/° C. or less, and a mold pattern which is formed on the base pattern;
- applying a curable material on a substrate;
- and
- pressing the imprint mold on the curable material.
1 more element
Dependencies are inferred from the claim text.