Cmos image sensors and related devices and fabrication methods
AssigneeSamsung Electronics Co., Ltd.
InventorByung-Jun Park
Life of this patent
Estimating the term…
Abstract
An image sensor device includes a substrate including a light sensing, region therein and a reflective structure on a first surface of the substrate over the light sensing region. An interconnection structure having a lower reflectivity than the reflective structure is provided on the first surface of the substrate adjacent to the reflective structure. A microlens is provided on a second surface of the substrate opposite the first surface. The microlens is configured to direct incident light to the light sensing region, and the reflective structure is configured to reflect portions of the incident light that pass through the light sensing region back toward the light sensing region. Related devices and fabrication methods are also discussed.
Claims12
An image sensor device, comprising:
- a substrate including a light sensing region therein;
- a reflective structure on a first surface of the substrate over the light sensing region;
- an interconnection structure having a lower reflectivity than the reflective structure on the first surface of the substrate adjacent to the reflective structure;
- and
- a microlens and a color filter on a second surface of the substrate opposite the first surface.
- wherein the reflective structure is configured to reflect portions of the incident light that pass through the light sensing region back toward the light sensing region.
-20. (canceled)
Dependencies are inferred from the claim text.