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US 2010/0148088 A1Published application
Techniques for providing a multimode ion source
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsSvetlana Radovanov, Bon-Woong Koo, Frank Sinclair, Victor M. Benveniste
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Abstract
Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation, the apparatus including an ion source having a hot cathode and a high frequency plasma generator, wherein the ion source has multiple modes of operation.
Claims20
A multi-mode ion source comprising:
- a chamber;
- an indirectly heated cathode coupled to said chamber;
- a second plasma source;
- and
- a plasma pipe connecting said second plasma source to said chamber.
2 more elements
A method for generating ions comprising:
- ionizing a species in a plasma source thereby forming ions;
- transporting said ions to a chamber through a plasma pipe;
- extracting said ions from said chamber.
A method for ionization comprising:
- ionizing a species containing a halogen in a plasma source thereby forming halogen ions;
- transporting said halogen ions to an arc chamber through a plasma pipe.
Dependencies are inferred from the claim text.