Device and method for manufacturing a particulate filter with regularly spaced micropores
AssigneeUniversity of Houston
InventorsJohn C. Wolfe, Paul Ruchhoeft
Life of this patent
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Abstract
Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly spaced pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.
Claims26
A lithographic exposure device for fabricating a microporous filter membrane, said microporous filter membrane not supported by a solid substrate, comprising:
- means for exposing a membrane substrate to a beam comprising at least one energetic particle;
- means for conveying said membrane substrate;
- and,
- a mask positioned between said membrane substrate and at least one source of said at least one energetic particle, said beam comprising at least one particle transmitted through said mask.
A lithographic exposure device for fabricating a microporous filter membrane, said microporous filter membrane not supported by a solid substrate, comprising:
- a radiation source directed at least partially on a membrane substrate, wherein said radiation source's radiation emitted comprises a beam of at least one energetic particle;
- a device for conveying said membrane substrate comprising at least one supply reel and at least one take-up reel;
- and,
- a mask positioned between said membrane substrate and at least one source of said at least one energetic particle, said beam comprising at least one particle transmitted through said mask.
A process for fabricating a microporous filter membrane filter, said microporous filter membrane not supported by a solid substrate, said process comprising the steps of:
- conveying a membrane substrate in a stepwise fashion adjacent a mask;
- damaging said membrane substrate with at least one beam comprising at least one energetic particle emitted from at least one radiation source directed at least partially through said mask;
- and,
- removing said damaged membrane substrate with an etchant.
A process for fabricating a microporous membrane filter, said process comprising the steps of:
- applying an intermediate mask layer and a resist coating to a membrane substrate;
- conveying said membrane substrate in a stepwise fashion adjacent a mask;
- exposing said resist coating with at least one beam comprising at least one energetic particle emitted from at least one radiation source directed at least partially through said mask;
- developing said resist coating;
- etching said resists' pattern through said intermediate mask layer;
- and,
- etching said intermediate mask layer's pattern into said membrane substrate.
Dependencies are inferred from the claim text.