High temperature and high voltage electrode assembly design

A chemical vapor deposition apparatus, comprising:

• a chamber having a base plate, a chamber wall, a gas inlet and a gas outlet, the base plate having holes therethrough;
• a plurality of electrodes extending through the holes of the base plate, the plurality of electrodes being capable of being attached to a power source, and at least two of the plurality of electrodes being capable of being electrically coupled to a silicon rod positioned in the chamber;
• an electrical isolation bushing positioned between each of the plurality of electrodes and the base plate;
• and
• an isolation layer in addition to the isolation bushing, the isolation layer surrounding the holes at the surface of the base plate.

A chemical vapor deposition apparatus, comprising:

• a chamber having a base plate, a chamber wall, a gas inlet and a gas outlet, the base plate having holes therethrough;
• a plurality of electrodes extending through the holes of the base plate, the plurality of electrodes being capable of being attached to a power source, and at least two of the plurality of electrodes being capable of being electrically coupled to a silicon rod positioned in the chamber;
• and
• an electrical isolation bushing positioned between each of the plurality of electrodes and the base plate, the electrical isolation bushing comprising a sleeve portion surrounding a portion of the electrodes that extends through the base plate and a collar portion surrounding the holes at a surface of the base plate, wherein the collar portion is a ceramic material.