Microlens alignment procedures in cmos image sensor design

A method, comprising:

• capturing an image using a first image sensor having a first microlens array formed using a first photo-mask;
• generating one or more correction parameters by evaluating the captured image;
• creating a second photo-mask based on the first photo-mask and the one or more correction parameters;
• and
• using the second photo-mask to form a second microlens array of a second image sensor.

An article of manufacture including a computer-readable medium having instructions stored thereon that, in response to execution by a computing device, cause the computing device to perform operations comprising:

• receiving image data captured by a first image sensor having a first microlens array formed using a first photo-mask design;
• calculating an error in alignment between the first image sensor and the first microlens array based on the image data;
• determining a shrink-factor based on the calculated error in alignment;
• and
• generating a second photo-mask design that corresponds to the first photo-mask design shrunken by the shrink-factor.

A method, comprising:

• using a first photo-mask design to form a first microlens array on a first sensor die;
• determining a de-centering value based on image data from the first image sensor;
• de-centering the first photo-mask design based on the de-centering value to obtain a second photo-mask design;
• and
• using the second photo-mask design to form a second microlens array on a second sensor die.

A system, comprising:

• an image source configured to produce an image;
• and
• a computing device configured to:
• receive image data generated by a first image sensor in response to capturing the image;
• determine, based on the image data, one or more correction parameters for a first photo-mask design used to form a first microlens array on the first image sensor;
• and
• create a second photo-mask design for a second microlens array on a second image sensor based on the first photo-mask design and the determined one or more correction parameters.