US 2010/0146475 A1 · METHODS AND SYSTEM FOR MODEL-BASED GENERIC MATCHING AND TUNING

Abstract

The present invention relates to a method for tuning lithography systems so as to allow different lithography systems to image different patterns utilizing a known process that does not require a trial and error process to be performed to optimize the process and lithography system settings for each individual lithography system. According to some aspects, the present invention relates to a method for a generic model-based matching and tuning which works for any pattern. Thus it eliminates the requirements for CD measurements or gauge selection. According to further aspects, the invention is also versatile in that it can be combined with certain conventional techniques to deliver excellent performance for certain important patterns while achieving universal pattern coverage at the same time.

Claims20

Dependent claims

A method of tuning a to-be-tuned lithographic process to a reference lithographic process, comprising:

obtaining respective lithographic process models for both the reference lithographic process and the to-be-tuned lithographic process;
identifying a set of tunable parameters of the to-be-tuned lithographic process, wherein the tunable parameters are distinct and independent from patterns to be imaged using the to-be-tuned lithographic process;
determining responses of the to-be-tuned lithographic process model to changes in the set of tunable parameters;
determining optimal changes in the tunable parameters that cause the lithographic process models to match;
and
adjusting the model for the to-be-tuned lithographic process based on the determined optimal changes.

3 more elements

Dependencies are inferred from the claim text.

Methods and system for model-based generic matching and tuning

Life of this patent

Methods and system for model-based generic matching and tuning

Life of this patent

Abstract

Claims20