Back to results
US 2010/0144255 A1Published application
Retaining ring and articles for carrier head
AssigneeApplied Materials, Inc., a Delaware corporation
InventorsDoyle E. Bennett, Andrew J. Nagengast, Hung Chih Chen
Life of this patent
Estimating the term…
Abstract
A carrier head for chemical mechanical polishing that has a base, a mounting assembly connected to the base having a surface for contacting a substrate, and a retaining ring secured to the base. The retaining ring can include perfluoroalkoxy, polyetherketoneketone, polybenzimidazole, a semi-crystalline thermoplastic polyester, or a long molecular chain molecule produced from poly-paraphenylene terephthalamide.
Claims16
A retaining ring for a chemical mechanical polishing head, comprising:
- an upper portion configured to be secured to a base;
- and
- a lower portion having a bottom surface to contact a polishing pad during polishing, wherein the lower portion includes a semi-crystalline thermoplastic polyester.
A carrier head for chemical mechanical polishing, comprising:
- a base;
- a mounting assembly attached to the base having a surface for contacting a substrate;
- and
- a retainer having an upper portion configured to be secured to a base and a lower portion having a bottom surface to contact a polishing pad during polishing, wherein the lower portion includes a semi-crystalline thermoplastic polyester.
1 more element
Dependencies are inferred from the claim text.