US 2010/0144153 A1 · Methods of Fabricating Substrates

Abstract

A method of fabricating a substrate includes forming spaced first features and spaced second features over a substrate. The first and second features alternate with one another and are spaced relative one another. Width of the spaced second features is laterally trimmed to a greater degree than any lateral trimming of width of the spaced first features while laterally trimming width of the spaced second features. After laterally trimming of the second features, spacers are formed on sidewalls of the spaced first features and on sidewalls of the spaced second features. The spacers are of some different composition from that of the spaced first features and from that of the spaced second features. After forming the spacers, the spaced first features and the spaced second features are removed from the substrate. The substrate is processed through a mask pattern comprising the spacers. Other embodiments are disclosed.

Claims37

Dependent claims

A method of fabricating a substrate, comprising:

forming spaced first features and spaced second features over a substrate, the first and second features alternating with one another and being spaced relative one another;
laterally trimming width of the spaced second features to a greater degree than any lateral trimming of width of the spaced first features while laterally trimming width of the spaced second features;
after the laterally trimming, forming spacers on sidewalls of the spaced first features and on sidewalls of the spaced second features, the spacers being of some different composition from that of the spaced first features and from that of the spaced second features;
after forming the spacers, removing the spaced first features and the spaced second features from the substrate;
and
after the removing of the spaced first and second features from the substrate, processing the substrate through a mask pattern comprising the spacers.

3 more elements

A method of fabricating a substrate, comprising:

forming spaced first features over a substrate;
depositing a first material over the spaced first features which is of some different composition from that of the spaced first features;
depositing a second material over the first material, the second material being of some different composition from that of the first material;
removing only a portion of the second material to expose the first material and form spaced second material received over the first material;
after forming the spaced second material, etching the first material from between the spaced second material and forming spaced second features which comprise spaced second material received over first material, the second features being spaced from the first features;
after the etching of the first material, laterally trimming width of the spaced second features;
after the laterally trimming, forming spacers on sidewalls of the spaced first features and on sidewalls of the spaced second features, the spacers being of some different composition from that of the spaced first features and from that of the spaced second features;
after forming the spacers, removing the first features and the second features from the substrate;
and
after the removing of the first features and the second features from the substrate, processing the substrate through a mask pattern comprising the spacers.

7 more elements

Dependencies are inferred from the claim text.

Methods of Fabricating Substrates

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Methods of Fabricating Substrates

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Abstract

Claims37