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US 2010/0144129 A1Published application
Method of manufacturing crystalline silicon
AssigneeSamsung Electronics Co., Ltd.
InventorsJung-hyun Lee, Dong-joon Ma
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Abstract
Disclosed is a method of manufacturing crystalline Si by using plasma. According to the disclosed method, silicon (Si) deposition and reduction processes using plasma are cyclically performed in order to completely remove an a-Si layer so as to form crystalline Si on a substrate early in the process.
Claims10
A method of manufacturing crystalline silicon (Si) on a substrate comprising:
- cyclically performing Si deposition and reduction processes using plasma in order to completely remove an a-Si layer.
Dependencies are inferred from the claim text.