Patterned fine particle film structures
AssigneeEmpire Technology Development LLC
InventorKazufumi Ogawa
Life of this patent
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Abstract
A patterned fine particle film structure includes a fine particle layer including fine particles arranged and bound to a surface of a substrate coated with a patterned film including a first film compound having a first functional group. The fine particles are coated with films including a first coupling agent having a first coupling reactive group that undergoes a coupling reaction with the first functional group to form a bond. The fine particle layer is bound by a bond formed through a coupling reaction. In an embodiment, fine particles coated with films of a film compound that reacts with the first coupling reactive group and the fine particles are alternately bound to the substrate.
Claims21
-31. (canceled)
A film structure, comprising:
- a substrate;
- a first linker linked to the substrate and having a first reactant product;
- a fine particle;
- a second linker linked to the particle and having a second reactant product;
- and
- a coupling agent linking the first reactant product of the first linker and the second reactant product of the second linker so as to link the particle and the substrate.
A method of forming a film structure, comprising:
- linking a first linker to a substrate such that the first linker extends a first reactant product away from the substrate;
- linking a second linker to a particle such that the second linker extends a second reactant product away from the particle;
- and
- coupling the first reactant product of the first linker to the second reactant product of the second linker with a coupling agent so as to link the particle to the substrate, wherein the coupling agent reacts with the first linker and second linker.
A method of forming a film structure, comprising:
- providing a substrate having one or more first active hydrogen groups;
- linking a first plurality of alkoxysilane linkers to the substrate through the first active hydrogen group, the first alkoxysilane linker having a first epoxide or amine or imine group;
- selectively removing a portion of the alkoxysilane linkers to form a pattern on the substrate;
- providing a plurality of fine particles having one or more second active hydrogen groups;
- linking a second plurality of alkoxysilane linkers to the particle through the second active hydrogen group, the second alkoxysilane linker having a second epoxide or amine or imine reactant product;
- and
- reacting:
- a coupling agent with the first epoxide or amine or imine group of the first linker and then reacting the coupling agent with the second epoxide or amine or imine group of the second linker;
- or
- a coupling agent with the second epoxide or amine or imine group of the second linker and then reacting the coupling agent with the first epoxide or amine or imine group of the first linker.
Dependencies are inferred from the claim text.