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US 2010/0143602 A1Published application
Method for coating a substrate
OwnerAndreas HEFT, Andreas Pfuch +3inventors
InventorsAndreas HEFT, Andreas Pfuch, Arnd Schimanski, Bernd Gruenler, Martin Polster
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Abstract
A method for coating a substrate is provided in that a plasma jet is produced from a working gas, at least one precursor material is fed to the working gas and/or the plasma jet and is reacted in the plasma jet and at least one reaction product of at least one of the precursors is deposited on at least one surface of the substrate and/or on at least one layer arranged on the surface. At least one of the deposited layers improve the optical transmission properties of the substrate.
Claims15
A method for coating a substrate, the method comprising:
- generating a plasma jet from a working gas;
- supplying at least one precursor material to the working gas and/or the plasma jet, the at least one precursor material being reacted in the plasma jet;
- and
- depositing at least one reaction product having at least one precursor material on at least one surface of the substrate and/or on at least one layer arranged on the surface,
- wherein at least one of the deposited layers improves an optical transmission of the substrate and/or reduces a reflection,
- wherein the substrate at least for a first coating is hot or is heated,
- wherein the first coating occurs subsequent to a substrate manufacturing process in which the substrate is formed with the aid of heat, and
- wherein the generation of the plasma occurs in a free jet plasma source.
5 more elements
Dependencies are inferred from the claim text.