Stabilization of Bicycloheptadiene
AssigneesAmerican Air Liquide, Inc., L'Air Liquide, Societe Anonyme pour l'Etude et I'Exploitation des Procedes Georges Claude
InventorsJames J.F. MCANDREW, Jean-Marc Girard, Yves Marot, Daniel André Gobard
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Abstract
Disclosed are stabilized bicyclo[2.2.1]hepta-2,5-diene compositions and methods of making and using the same.
Claims26
A composition for providing a low-k film comprising bicyclo[2.2.1]hepta-2,5-diene and at least one additive, the composition containing less than 50 ppmw non-volatile material.
A method for stabilizing bicyclo[2.2.1]hepta-2,5-diene (BCHD), comprising the steps of providing BCHD and adding to the BCHD at least one additive selected from the group consisting of nitrones, quinones, a mixture of nitrones and quinones, a mixture of nitrones and stable nitroxides, and a mixture of quinones and stable nitroxides.
A method of forming an insulating film layer on a substrate, the method comprising the steps of:
- providing a reaction chamber having at least one substrate disposed therein;
- introducing at least one precursor compound into the reaction chamber;
- introducing into the reaction chamber a composition comprising bicyclo[2.2.1]hepta-2,5-diene and at least one additive selected from the group consisting of nitrones, quinones, a mixture of nitrones and quinones, a mixture of nitrones and stable nitroxides, and a mixture of quinones and stable nitroxides;
- and
- contacting the at least one precursor compound, the composition, and the substrate to form an insulating film on at least one surface of the substrate using a deposition process.
Dependencies are inferred from the claim text.