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US 2010/0143274 A1Published application
Use of amines and amides for the stabilization of organic micronized uv absorbers
AssigneeCiba Corporation
InventorsCyrille Deshayes, Thomas Ehlis, Julie Grumelard
Life of this patent
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Abstract
Disclosed is the use of amines and amides for the stabilization of a cosmetic composition comprising: (a) an organic micronized UV absorber selected from a benzophenone derivative and (b) a dibenzoylmethane derivative. The use of the amines and amides results in the stabilization of the end-product formulations.
Claims18
A cosmetic composition comprising
- (a) 0.1 to 20% b.w. of a micronized benzophenone UV absorber of formula (1),
- (b) 0.1 to 10% b.w. of a methoxydibenzoylmethane derivative and
- (c) 0.1 to 50% b.w. of an amine or an amide,
- wherein
- R1 and R2 independently from each other are C1-C20alkyl;
- C2-C20alkenyl;
- C3-C10cycloalkyl;
- C3-C10cycloalkenyl;
- or R1 and R2 together with the linking nitrogen atom form a 5- or 6-membered heterocyclic ring;
- n1 is a number from 1 to 4;
- when n1=1,
- R3 is a saturated or unsaturated heterocyclic radical;
- hydroxy-C1-C5alkyl;
- cyclohexyl optionally substituted with one or more C1-C5alkyl;
- or phenyl optionally substituted with a heterocyclic radical, aminocarbonyl or C1-C5alkylcarboxy;
- when n1 is 2,
- R3 is an alkylene-, cycloalkylene, alkenylene or phenylene radical which is optionally interrupted by —O—, —NH—, a carbonyl- or a carboxy group;
- a radical of formula *—CH2—C≡C—CH2—*;
- or R3 together with A forms a bivalent radical of the formula
- wherein
- n2 is a number from 1 to 3;
- when n1 is 3,
- R3 is an alkantriyl radical;
- when n1 is 4,
- R3 is an alkanetetrayl radical;
- A is —O—;
- or —N(R5)—;
- and
- R5 is hydrogen;
- C1-C5alkyl;
- or hydroxy-C1-C5alkyl.
28 more elements
(canceled)
18-21. (canceled)
Dependencies are inferred from the claim text.