Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMarcel Mathijs Theodore Marie Dierichs, Hans Van Der Laan, Hendrikus Robertus Marie Van Greevenbroek
Life of this patent
Estimating the term…
Abstract
A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.
Claims13
A lithographic projection apparatus, comprising:
- a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation, the reflective optical elements including a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
- and
- a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror, and comprising a masking blade selectively interposable into the beam.
A lithographic projection apparatus, comprising:
- a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation, the reflective optical elements including a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror, wherein a group of adjacent facets of the first faceted mirror are arranged to direct radiation to an area of the second mirror, the area being arranged in a configuration selected from the group comprising:
- a substantially annular configuration, a multipole configuration, a substantially circular configuration, and any combination of the above configurations;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
- and
- a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror.
Dependencies are inferred from the claim text.