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US 2010/0140858 A1Published application
'All In One' Spring Process For Cost-Effective Spring Manufacturing And Spring Self-Alignment
AssigneePalo Alto Research Center Incorporated
InventorsThomas Hantschel, David K. Fork
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Abstract
A method of forming spring structures using a single lithographic operation is described. In particular, a single lithographic operation both defines the spring area and also defines what areas of the spring will be uplifted. By eliminating a second lithographic operation to define a spring release area, processing costs for spring fabrication can be reduced.
Claims11
An intermediate structure for forming a stressed metal spring structure, the intermediate structure comprising:
- a substrate having a surface,
- a release/seed layer disposed on the substrate surface;
- a resist material mask disposed on the release/seed layer, the resist material mask defining an opening and having a peripheral resist edge that surrounds the opening;
- a spring material formed in the opening and on a portion of the release/seed layer such that an interface gap is formed between a perimeter of the spring material and the peripheral resist edge.
1 more element
A spring structure comprising:
- a planar substrate;
- a spring release portion having a lateral dimension d, the spring release portion bends out of a substrate plane;
- a spring anchor coupled to the spring release portion, the spring anchor coupled to the planar substrate by an anchor release layer, the distance from an edge of the spring anchor to an edge of the anchor release layer exceeding a distance of d/2.
A spring structure comprising:
- a planar substrate;
- a release layer portion fixedly attached to the planar substrate;
- and
- a spring including:
- an anchor portion disposed on the release layer portion such that the anchor portion is fixedly attached to the planar substrate by said release layer portion;
- and
- a release portion extending from a peripheral edge of the anchor portion and bending away from the planar substrate,
- wherein a peripheral edge of the anchor portion extends beyond a perimeter of the release layer portion such that an undercut region is defined under a peripheral portion of the anchor portion.
5 more elements
Dependencies are inferred from the claim text.