Positive Tone Bi-Layer Method
AssigneeMolecular Imprints, Inc.
InventorSidlgata V. Sreenivasan
Life of this patent
Estimating the term…
Abstract
Methods of patterning a substrate including creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions are described. A polymerizable material composition is dispense on the patterned layer defining a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions.
Claims20
A method of patterning a substrate, the method comprising:
- forming a patterned layer on a substrate, the patterned layer having protrusions and recessions;
- dispensing polymerizable material on the patterned layer, defining a conformal layer, the patterned layer and the conformal layer collectively defining a multi-layered structure, the multi-layered structure having a crown surface facing away from the substrate;
- and,
- selectively removing portions of the multi-layered structure to expose regions of the substrate in superimposition with the protrusions while forming a hard mask in areas of the crown surface in superimposition with the recessions.
A method of patterning a substrate, the method comprising:
- creating a multi-layered structure with e-beam lithography by forming, on the substrate, a patterned layer having protrusions and recessions, by dispensing, on the substrate, droplets of polymerizable fluid composition and contacting the polymerizable fluid composition with a surface of a mold, and subjecting the polymerizable fluid composition to conditions to polymerize the polymerizable fluid composition, forming the patterned layer, and forming, upon the patterned layer, a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate;
- and
- selectively removing portions of the multi-layered structure to expose regions of the substrate in superimposition with the protrusions while forming a hard mask in areas of the crown surface in superimposition with the recessions.
A method of patterning a substrate, the method comprising:
- creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions, by disposing, on the substrate, droplets of a polymerizable fluid composition and contacting the polymerizable fluid composition with a surface of a mold, and subjecting the polymerizable fluid composition to conditions to polymerize the polymerizable fluid composition, forming the patterned layer, and forming, upon the patterned layer, a conformal layer, with the multi-layered structure having a crown surface facing sway from the substrate;
- and
- selectively removing portions of the multi-layered structure to expose regions of the substrate in superimposition with the protrusions while forming a hard mask in areas of the crown surface in superimposition with the recessions.
Dependencies are inferred from the claim text.