Excited gas injection for ion implant control

A method of improving ion current output of specific ion species from a ion source, comprising:

• a. Supplying an ion source comprising:
• i. an ion chamber housing defining an ion source chamber, wherein molecules enter said housing via one or more inlets;
• ii. A gas source in communication with a remote plasma generator;
• and
• iii. Said remote plasma generator having an output in communication with one of said inlets, wherein said generator transforms gas supplied by said gas source into an altered state prior to delivery to said ion chamber;
• and
• b. Energizing said remote plasma generator to create altered molecules that are then delivered to said ion source.

A method of improving the uniformity of both neutral molecules and plasma within a plasma processing system, comprising:

• a. Supplying a plasma processing system comprising:
• i. A chamber, having a workpiece disposed within;
• ii. A plurality of inlets through which molecules pass into said chamber;
• iii. A plasma generator adapted to transform said molecules into a plasma;
• iv. A gas source in communication with a remote plasma generator;
• and
• v. Said remote plasma generator having an output in communication with one of said plurality of inlets;
• and
• b. Energizing said remote plasma generator to create altered molecules that are then delivered to said one of said plurality of inlets.